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Ion sputtering w target 99.95%- Tungsten target--sputtering target(Mat-cn)

W-t

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Description

Material W
Brand MAT-CN
Origin Nanchang Jiangxi

Specifications
Size 01: diameter <360mm thickness> 1 mm (wafer / round table / rod)
Size 02: length <300mm width <300mm thickness> 1mm rectangular / sheet / step-like (splicing)
Size 03: outer diameter <360mm inner diameter> 1mm wall degree> 1 mm length> 1 mm (pipe / ring / rotatable targets)
Size 04 :: be customized according to user needs, sample processing, to map processing

Minimum order quantity
1, large concessions

Supply capacity
the same batch, the same material, continuous and reliable supply; 100 kg / month min

Delivery time
a single sheet of material 1 week delivery, bulk material 20 days -30 days delivery(working days)

Production process
vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining

Applicable instruments
various models magnetron sputtering equipment, etc.

Product uses
industrial-grade coating, experiments or research level W target, electronics, optoelectronics, military, decorative, functional film

Advantages
quality
1. reliability, price
2.restore Preparation of high purity, less impurities
3.Dense, rolling, oxidation, forming plasticizers
4.relatively high density, grain uniformity axis, consistency

Product accessories
formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice

Packing vacuum
packaging / vacuum neutral packing / special packaging outside reinforcement package

Mode of transport for
UPS, DHL or FedEx or Ship(FOB/CIF)

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