Magnetic Materials
High density and high uniformity Ti target- Titanium target-sputtering target(Mat-cn)
Ti-t
Description
Material Ti
Brand MAT-CN
Origin Nanchang Jiangxi
Specifications
Size 01: diameter <360mm thickness> 1 mm (wafer / round table / rod)
Size 02: length <300mm width <300mm thickness> 1mm rectangular / sheet / step-like (splicing)
Size 03: outer diameter <360mm inner diameter> 1mm wall degree> 1 mm length> 1 mm (pipe / ring / rotatable targets)
Size 04 :: be customized according to user needs, sample processing, to map processing
Minimum order quantity
1, large concessions
Supply capacity
the same batch, the same material, continuous and reliable supply; 100 kg / month min
Delivery time
a single sheet of material 1 week delivery, bulk material 20 days -30 days delivery(working days)
Production process
vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining
Applicable instruments
various models magnetron sputtering equipment, etc.
Product uses
industrial-grade coating, experiments or research level Ti target, electronics, optoelectronics, military, decorative, functional film
Advantages
quality
1. reliability, price
2.restore Preparation of high purity, less impurities
3.Dense, rolling, oxidation, forming plasticizers
4.relatively high density, grain uniformity axis, consistency
Product accessories
formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice
Packing vacuum
packaging / vacuum neutral packing / special packaging outside reinforcement package
Mode of transport for
UPS, DHL or FedEx or Ship(FOB/CIF)
Read More
China Material Technology Co., Ltd.
Hi-purity metal, sputtering target
Address: 589 GaoXin Road,NanChang Hi-Tech Industry Development Zone, NanChang, JiangXi, China,
Nanchang, Jiangxi
China, 330096
Tel: 0086079188165996
Fax: 0086079188165992
