New Materials

  1. Home
  2. Products
  3. Minerals & Metallurgy
  4. New Materials

Titanium Nitride (TiN) sputtering target
Share us

Titanium Nitride (TiN) sputtering target

Titanium Nitride (TiN) sputtering target
Send Inquiry

Description

Name: Titanium Nitride (TiN) sputtering target
Molecular formula: TiN
Color: gold color
Brand Name: CRM
Purity: 99.5%min
biggest size: Disc 18 inch （457.2mm) diameter
450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm
Relative Density: 90%min
produce way: hot pressing
Production Capacity: about 1000kg per month

TiN, sputtering target,

Read More

Previous

Titanium Oxide (TiOx) sputtering target...

Previous

Molybdenum Sulfide (MoS2) sputtering target...

China Rare Metal Material Co., Ltd

sputtering target,coating material,compound semiconductor materials,rare earth materials

Address: Unit 1208-1212,HongGu JingDian Building, No.1378 HongGu Avenue,,
Nanchang, Jiangxi
China, 330038

Tel: 0086-791-88101311
Fax: 0086-791-88101211

H5响应式定制设计
26种语言,SEO营销型网站

H5/响应式/营销型企业网站; 26种语言扩展;
覆盖: 英文、法语、德语、西班牙语、葡萄牙语、俄语、阿拉伯语、波斯语、日语、韩语
了解更多