Alloy

Share us

Si90Al10wt% sputtering target (silicon aluminum)

silicon aluminum(SiAl)

Description

Si90Al10wt% sputtering target (silicon aluminum sputtering target)
purity 99.9%min
produce way: HIP(hot isostatic pressing)
max size: 950mm length x280mm width
RD 98%

we with competitive price and high quality and always welcome your inquires.

Si90Al10wt% sputtering target, silicon aluminum,

Read More

Previous

Nickel-Chromium (Ni-Cr) alloy sputtering target...

Previous

Bismuth (Bi) Sputtering Targets...

China Rare Metal Material Co., Ltd

sputtering target,coating material,compound semiconductor materials,rare earth materials

Address: Unit 1208-1212,HongGu JingDian Building, No.1378 HongGu Avenue,,
Nanchang, Jiangxi
China, 330038

Tel: 0086-791-88101311
Fax: 0086-791-88101211

H5响应式定制设计
26种语言,SEO营销型网站


H5/响应式/营销型企业网站; 26种语言扩展;
覆盖: 英文、法语、德语、西班牙语、葡萄牙语、俄语、阿拉伯语、波斯语、日语、韩语
了解更多